Synonyms: Tetraethyl orthosilicate; Orthosilicic acid tetraethyl ester; Silicon tetraethoxide; Tetraethoxysilane; Tetraethoxysilicon(IV); Tetraethyl silicate; Orthosilicic acid tetraethyl ester; TEOS; Tetraethoxysilane
CAS Number: 78-10-4
Formula: C8H20O4Si
Formula Weight: 208.33
Linear Formula: Si(OC2H5)4
MDL No.: MFCD00009062
Purity: >=99.5% (GC)
Boiling Point: 168 C(lit.)
Density: 0.933 g/mL at 20 C(lit.)
Refractive Index: n20/D 1.382(lit.)
Beilstein Registry Number: 1422225
EC Number: 201-083-8
UNSPSC Code: 12352300
Application: Commonly used as a precursor to prepare xerogel
Application: Will interact with dodecylamine in the formation of intercalation compounds of H+-magadiite and used in a study of mixed-metal bioactive glasses.
Application: Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:. Si oxide. Oxycarbide. Doped silicate. Silanol. Siloxane polymer. Organosilicon thin filmsThe films can be deposited at low temperatues (<250 c). teos is also used to deposit mesoporous and nanoporous thin films of silica. these porous films can be doped during deposition to further enhance their properties.<>
RTECS: VV9450000
RIDADR: UN1292 - class 3 - PG 3 - Tetraethyl silicate
WGK Germany: 1
Flash Point(F): 113 F
Flash Point(C): 45 C
R Codes: 10-20-36/37
IOD Codes: Xn
Symbol: GHS02, GHS07
Signal Word: Warning
Hazard Statements: H226-H319-H332-H335
Precautionary statements: P210-P261-P280-P304 + P340 + P312-P337 + P313-P403 + P235