UN1790, Reagents, B
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Buffered oxide etchant (BOE) 10:1 with surfactant
MilliporeSigmaBuffered oxide etchant (BOE) is a wet etchant used in microfabrication. Its primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). It is a mixture of a buffering agent, such as ammonium fluoride (NH4F), and hydrofluoric acid (HF). Concentrated HF etches silicon…
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Buffered oxide etchant (BOE) 6:1 with surfactant
MilliporeSigmaBuffered oxide etchant (BOE) is a wet etchant used in microfabrication. Its primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). It is a mixture of a buffering agent, such as ammonium fluoride (NH4F), and hydrofluoric acid (HF). Concentrated HF etches silicon…
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Buffer HF improved
MilliporeSigmaImproved HF Buffer System with stabilized HF activity - selective solvent for SiO2 used in semiconductor technology of planar passivated devices - transistors, integrated circuits, diodes, rectifiers, SCR, MOS, FETAdvantages: •Ready-to-use - Economical •HF activity buffer stabilized •Excellent…